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Physical Vapor Deposition (PVD)
Physical Vapor Deposition Systems can deposit thin layers on different surfaces such as stainless steel, glass, ceramics, plastic, acrylic, resin, etc. This technique is frequently used for materials research and also for large scale productions.
Thermal Evaporation
Thermal Evaporation is a physical vapor deposition technique for thin film coating frequently used because of its simplicity through heating.
Pulsed Laser Deposition
This technique for thin film deposition is used to deposit materials such as nitrides, oxides, polymers and composites.
Sputtering deposition
Sputtering is a plasma based deposition process in which energetic ions are accelerated towards a target to the substrate .
Vacuum Arc deposition system
Usually used for industrial hard coating, this technique is applied through a high-current plasma discharge between two metallic electrodes in high vacuum conditions.
Electron Beam Evaporation system (E-beam)
Usually used for industrial hard coating, this technique is applied through a high-current plasma discharge between two metallic electrodes in high vacuum conditions.